RIE etching SiO2 experimental parameters list |...
Etch rate of SiO2 by CHF3-RIE. (a) Measured dep...
Corial 200S RIE etch system | Corial
Etch rates of SiO 2 using (a) C 4 F 8 , (b) CHF...
Process parameters for RIE etching of SiO2 and ...
Corial 200I ICP-RIE etch system | Corial
SiO2 etching profile, etch rate, and selectivit...
Corial Plasma Therm – Corial 200I ICP-RIE etch ...
(a) Patterning and RIE etching of SOI and inter...
(a) The SiO2 layer immediately after RIE plasma...
Corial 200R RIE etch system | Corial
Reactive Ion Etching (RIE) | Thierry Corporation
The cross-section below is to be etched via rea...
Etch rates of dHF (left) and O2-RIE (right) for...
2. Etch depth of SiO2 and AZ-5214e photoresist ...
Corial 200FA RIE Etch system | Corial
RIE | NANO-MASTER, Inc. | Reactive Ion Etching
2. You are asked to etch SiO2 as shown below. A...
Etch rates and dc bias vs SF 6 flow, RIE; gas f...
Corial 210RL RIE etch system | Corial
Si, SiO 2 , and PR etch rates and etch selectiv...
Etch rates of SiO2 thin film under various proc...
Etch characteristics of SiN x and SiO2 (a) as a...
The relationship of SOG etch rate at wafer cent...
Modeling estimates of the SiO 2 etch rate as a ...
Characteristics of the SiO 2 etch rate with H 2...